Characterizing the effects of multiprocess parameters on the preferred orientation of TiN coating using a combined index

Vacuum

Volumn 66, Issue 1, 2002, Pages 19-25

  Chen, Y M ^a,b   Yu, G P ^b   Huang, J H ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Hollow cathode discharge; Preferred orientation; Titanium nitride

Indexed keywords

COATINGS; ELECTRIC POTENTIAL; PHYSICAL VAPOR DEPOSITION; THERMOANALYSIS;

BIAS VOLTAGES; ION-PLATING; PREFERRED ORIENTATION;

TITANIUM NITRIDE;

EID: 0036606198     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00416-X     Document Type: Article

References (21)