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Volumn 80, Issue 11, 1996, Pages 6279-6285

Properties of TiN films deposited at low temperature in a new plasma-based deposition system

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001167250     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363704     Document Type: Article
Times cited : (46)

References (43)
  • 3
  • 25
    • 84915405798 scopus 로고
    • edited by E. Broszeit Informationsgesellschaft, Oberursel 1
    • D. S. Rickerby, D. S. Whitnell, and C. F. Ayres, in Plasma Surface Engineering, edited by E. Broszeit (Informationsgesellschaft, Oberursel 1, 1989), Vol. 2, p. 911.
    • (1989) Plasma Surface Engineering , vol.2 , pp. 911
    • Rickerby, D.S.1    Whitnell, D.S.2    Ayres, C.F.3
  • 43
    • 0037997768 scopus 로고
    • JCPDS International Center for Diffraction Data, Swarthmore, PA
    • Powder Diffraction File (JCPDS International Center for Diffraction Data, Swarthmore, PA, 1991).
    • (1991) Powder Diffraction File


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.