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Volumn 48, Issue 14, 2000, Pages 3745-3759

Crystallography and structural evolution of cubic boron nitride films during bias sputter deposition

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; FILM GROWTH; GRAIN BOUNDARIES; NUCLEATION; SILICON WAFERS; SPUTTER DEPOSITION; TWINNING; VAPOR DEPOSITION;

EID: 0034274201     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(00)00159-2     Document Type: Article
Times cited : (36)

References (46)
  • 29
    • 0003797160 scopus 로고
    • F.C. Matacotta, & G. Ottaviani. Singapore, New Jersey, London, Hongkong: World Scientific Publishing Co. Pte. Ltd
    • Hackenberger L.B., Pilione L.J., Messier R. Matacotta F.C., Ottaviani G. Science and Technology of Thin Films. 1995;121 World Scientific Publishing Co. Pte. Ltd, Singapore, New Jersey, London, Hongkong.
    • (1995) Science and Technology of Thin Films , pp. 121
    • Hackenberger, L.B.1    Pilione, L.J.2    Messier, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.