The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 335-340

  Patsalas, P ^a   Charitidis, C ^a   Logothetidis, S ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Grain growth; Nano indentation; Sputtering; Titanium nitride; X ray diffraction

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELASTIC MODULI; FILM GROWTH; GRAIN SIZE AND SHAPE; HARDNESS TESTING; SPUTTERING; STIFFNESS; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS; TITANIUM NITRIDE;

DEPTH SENSING NANOINDENTATION TESTS;

THIN FILMS;

EID: 0033882382     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00606-4     Document Type: Article

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