Multiscale modeling of thin-film deposition: Applications to si device processing

MRS Bulletin

Volumn 26, Issue 3, 2001, Pages 182-189

  Baumann, F H ^a   Chopp, D L ^b   Diaz De La Rubia T ^c   Gilmer, G H ^a   Greene, J E ^d   Huang, H ^e   Kodambaka, S ^d   O'Sullivan P ^a   Petrov, I ^d  

^a LUCENT TECHNOLOGIES   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^e HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001688094     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2001.40     Document Type: Article

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