Preferred orientation in Ti films sputter-deposited on SiO2 Glass: The role of water chemisorption on the substrate

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 2 PART A, 1997, Pages

  Ohwaki, Takeshi ^a   Yoshida, Tomoyuki ^a   Hashimoto, Shoji ^a   Hosokawa, Hideki ^a   Mitsushima, Yasuichi ^a   Taga, Yasunori ^a  

^a Rd Management Section   (Japan)

Author keywords

H2O gas introduction; Preferred orientation; RHEED; Sputter deposition; Ti films; Water chemisorption; XRD

Indexed keywords

CHEMISORPTION; CRYSTAL ORIENTATION; FREE ENERGY; FUSED SILICA; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING GLASS; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM; X RAY CRYSTALLOGRAPHY;

SURFACE FREE ENERGY;

METALLIC FILMS;

EID: 0031074672     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l154     Document Type: Article

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