An atomistic simulator for thin film deposition in three dimensions

Journal of Applied Physics

Volumn 84, Issue 7, 1998, Pages 3636-3649

  Huang, Hanchen ^a   Gilmer, George H ^b   De La Rubia, Tomas Díaz ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744309036     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368539     Document Type: Article

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