Physical processes in EUV sources for microlithography

Journal of Physics D: Applied Physics

Volumn 44, Issue 25, 2011, Pages

  Banine, V Y ^a   Koshelev, K N ^b   Swinkels, G H P M ^a  

^a ASML   (Netherlands)

^b INSTITUTE OF SPECTROSCOPY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

13.5 NM; CUSTOMER REQUIREMENTS; DEEP ULTRAVIOLET; DISSIPATED POWER; EUV SOURCE; EXTREME ULTRAVIOLET; HIGH DEMAND; HIGH TEMPERATURE; HIGH TRANSMISSION; INTEGRAL PART; KEV IONS; LIGHT PRODUCTION; LIGHT TRANSPORT; LITHOGRAPHY TOOLS; MATERIAL SCIENCE; NANOMETRES; ON-WAFER; PHYSICAL PROCESS; RESEARCH FACILITIES; SPECTRAL PURITY; TECHNOLOGICAL CHALLENGES;

DEBRIS; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT; LIGHT SOURCES; MANUFACTURE;

LITHOGRAPHY;

EID: 79958786577     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/25/253001     Document Type: Review

References (101)

1. Finders J, Dusa M, Nikolsky P, Van Dommelen Y, Watso R, Vandeweyer T, Beckaert T, Laenens B and Van Look L 2010 Litho and patterning challenges for memory and logic applications at the 22nm node Proc. SPIE 7640 76400C1
2. Castenmiller T, van de Mast F, De Kort T, van de Vin C, De Wit M, Stegen R and van Cleef S 2010 Towards ultimate optical lithography with NXT:1950i dual stage immersion platform Proc. SPIE 7640 76401N
3. Bouchoms I, Mulkens J, De Putter S, Gunter P, De Graaf R, Beems M, Verdurnen E, Jasper H, Dieckmann N and Bornebroek F 2010 Advanced imaging with 1.35 NA immersion systems for volume production Proc. SPIE 7640 76401R1
4. Wagner C et al 2010 EUV into production with ASML's NXE platform Proc. SPIE 7636 76361H
5. Kim H W, Na H S, Cho K Y, Park C M, Yasue T, Mayya S and Cho H K 2010 Patterning with EUVL: the road to 22 nm node Proc. SPIE 7636 76360Q
6. Putna S E, Younkin T R, Caudillo R and Chandhok M 2010 EUV Lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs Proc. SPIE 7636 76360P
7. Banine V, Yakunin A and Glushkov D 2010 Next generation EUV lithography: challenges and opportunities 2010 Int. Workshop on Extreme Ultraviolet Sources (Dublin, Ireland, 13-15 November 2010)
8. Attwood D 1999 Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press)
9. Banine V and Moors R 2004 Plasma source or EUV lithography exposure tools J. Phys. D: Appl. Phys. 37 3207-212
10. Bakshi V 2006 EUV Sources for Lithography (Bellingham, WA: SPIE Press)
11. Kubiak G D, Bernardez L J II and Krenz K D 1998 High-power extreme-ultraviolet source based on gas jets Proc. SPIE 3331 81
12. Moyer R H, Shields H, Martos A, Fornaca S W, St Pierre R J and Petach M B 2001 Laser-produced plasma (LPP) scale-up and commercialization Proc. SPIE 4343 249
13. Shields H, Fornaca S W, Petach M B, Michaelian M, McGregor R D, Moyer R H and St Pierre R 2002 Xenon target performance characteristics for laser-produced plasma EUV sources Proc. SPIE 4688 94
14. Hansson B A M 2003 Laser-plasma sources for extreme-ultraviolet lithography Thesis KTH Physics, Stockholm
15. Fomenkov I V et al 2010 Laser produced plasma light source for EUVL Proc. SPIE 7636 763639
16. Mizoguchi H et al 2010 1st generation laser-produced plasma source system for HVM EUV lithography Proc. SPIE 7636 76308
17. Pankert J 2004 Philips's EUV source: update and issues EUVL Symp. (Miyazaki, Japan)
18. Pankert J et al 2006 EUV sources for the alpha-tools Proc. SPIE 6151 61510Q
19. Stamm U 2004 Extreme ultraviolet light sources for use in semiconductor lithography-state of the art and future development J. Phys. D: Appl. Phys. 37 3244-53
20. Stamm U, Kleinschmidt J, Nikolaus B, Schriever G, Schurmann M C and Ziener C 2005 Development status of EUV sources for use in alpha-, beta- and high volume chip manufacturing tools 4th Int. Symp. on EUV Lithography (San Diego, CA, 7 November 2005)
21. Meiling H, Banine V, Harned N, Blum B, Kuerz P and Meijer H 2005 Development of the ASML EUV alpha demo tool Proc. SPIE 5751 90
22. Corthout M, Teramoto Y and Yoshioka M 2010 XTREME Technologis: first tin beta SoCoMo ready for wafer exposure Presentation at Int. Symp. on Extreme Ultraviolet Lithography (Kobe, Japan, 19 October 2010)
23. Koshelev K, Krivtsun V, Ivanov V and Yakushev O 2010 New type of DPP source for EUVL based on liquid tin jet electrodes 2010 Int. Workshop on Extreme Ultraviolet Sources (Dublin, Ireland, 13-15 November 2010)
24. Yoshioka M, Teramoto Y, Zink P, Schriever G, Niimi G and Corthout M 2010 Tin DPP source collector module (SoCoMo): status of beta products and HVM developments Proc. SPIE 7636 763610
25. Bianucci G, Bragheri A, Cassol G L, Johnson B, Rossi M and Zocchi F E 2010 Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sources Proc. SPIE 7636 76360C
26. Feigl T, Yulin S, Benoit S and Kaiser N 2006 EUV multilayer optics Microelectron. Eng. 83 703-6 (Pubitemid 44316474)
27. Yakshin A E, Kozhevnikov I V, Zoethout E, Louis E and Bijkerk F 2010 Properties of broadband depth-graded multilayer mirrors for EUV optical systems Opt. Express 18 6957
28. Harilal S S, O'Shay B, Tao Y and Tillack M S 2007 Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects Appl. Phys. B 86 547-33
29. 2 gas J. Appl. Phys. 102 123310
30. Bleiner D and Lippert T 2009 Stopping power of a buffer gas for laser plasma debris mitigation J. Appl. Phys. 106 123301
31. Brandt D C et al 2010 LPP source system development for HVM Proc. SPIE 7636 76361I
32. Hoffman J R, Bykanov A N, Khodykin O V, Ershov A I, Bowering N R, Fomenkov I V, Partlo W N and Myers D W 2005 LPP EUV conversion efficiency optimization Proc. SPIE 5751
33. McGeoch M W 2006 Lithium DPP source development at PLEX Sematech EUV Source Workshop (Vancouver, Canada, 25 May 2006)
34. McGeoch M W 2010 Laser-heated discharge plasma extreme ultraviolet source J. Phys. D: Appl. Phys 43 105201
35. Horne S F, Niell F M, Partlow M J, Besen M M, Smith D K, Blackborow P A and Gustafson D 2009 Development of a high pulse rate EUV source Proc. SPIE 7271 72713A
36. Lebert R, Wiesemann U, Schafer D, Wilhein T, Phiesel C, Esser D, Hoefer M, Hoffmann D, Bergmann K and Stiel H 2010 The request for high-brilliant XUV sources: a first principle approach 2010 Int. Workshop on Extreme Ultraviolet Sources (Dublin, Ireland, 13-15 November 2010)
37. Tomie T et al 2003 Use of tin as a plasma source material for high conversion efficiency Proc. SPIE 5037 147
38. Richardson M, Koay C S, Takenoshita K, Keyser C and Al-Rabban M 2004 High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography J. Vac. Sci. Technol. B 22 785
39. Fomenkov I V et al 2007 Laser-produced plasma source system development Proc. SPIE 6517 65173j-1
40. 2 laser-produced Sn plasma using a cavity target Appl. Phys. Lett. 91 231501
41. Nishihara K et al 2008 Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography Phys. Plasmas 15 056708
42. Harilal S S, Sizyuk T, Sizyuk V and Hassanein A 2010 Efficient laser-produced plasma extreme ultraviolet sources using grooved Sn targets Appl. Phys. Lett. 96 111503
43. Van den Brink M, Jasper H, Slonaker S, Wijnhoven P and Klaassen F 1996 Step-and-scan and step-and-repeat, a technology comparison Proc. SPIE 2726 734
44. Sluijk B, Castenmiller T, du Croo de Jongh R, Jasper H, Modderman T, Levasier L, Loopstra E, Savenije G, Boonman M and Cox H 2001 Performance results of a new generation of 300 mm lithography systems Proc. SPIE 4346 544
45. Kemp K and Wurm S 2006 EUV lithography C. R. Phys. 7 875-86 (Pubitemid 44848167)
46. George S A, Naulleau P P, Rekawa S, Gullikson E and Kemp C D 2009 Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool Proc. SPIE 7271 72710X
47. Bibishkin M S et al 2008 Multilayer Zr/SI filters for EUV lithography and for radiation source metrology Proc. SPIE 7025 702502
48. Chkhalo N I, Gusev S A, Drozdov M N, Kluenkov E B, Lopatin A Y, Luchin V I, Pestov A E, Salaschenko N N, Shmaenok L A and Tsybin N N 2009 Influence of annealing on the structural and optical properties of thin multilayer EUV filters containing Zr, Mo and silicides of these metals Proc. SPIE 7521 752105
49. Soer W A, Jak M J J, Yakunin A M, Van Herpen M M J W and Banine V Y 2009 Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources Proc. SPIE 7271 72712Y
50. Van Herpen M M J W, Van der Kruijs R W E, Klunder D J W, Louis E, Yakshin A E, Alonso van der Westen S, Bijkerk F and Banine V 2008 Spectral-purity- enhancing layer for multilayer mirrors Opt. Lett. 33 560-2 (Pubitemid 351469879)
51. Soer WA, Gawlitza P, Van Herpen M M J W, Jak M J J, Braun S, Muys P and Banine V Y 2009 Extreme ultraviolet multilayer mirror with near-zero IR reflectance Opt. Lett. 34 3680
52. Van den Boogaard A J R, Louis E, Van Goor F A and Bijkerk F 2009 Optical element for full spectral purity from IR-generated EUV light sources Proc. SPIE 7271 72713B
53. Bienert M, Gohnemeier A, Natt O, Lowisch M, Graupner P, Heil T, Garreis R, Van Ingen Schenau K and Hansen S 2009 Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond J. Micro/Nanolith. 8 041509 MEMS MOEMS
54. Suzuki K, Miyake A and Harned N 2009 Joint requirements for EUV source EUVL Symp. (Prague, Czech Republic, 19 October 2009)
55. Hansson B A M and Hertz H M 2004 Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments J. Phys. D: Appl. Phys. 37 3233-43
56. 2 laser system for LPP EUV light source Presentation at Int. Symp. on Extreme Ultraviolet Lithography (Kobe, Japan, 17-20 October 2010)
57. http://www.wwk.com/coo.html
58. CXRO http://www.cxro.lbl.gov/ and/or http://henke.lbl.gov/optical- constants/
59. Banine V, Benschop J, Leenders M and Moors R 2000 The relationship between an EUV source and the performance of an EUV lithographic system Proc. SPIE 3997 126
60. Stuik R 2002 Characterization of XUV sources Thesis Technische Universiteit Eindhoven
61. Kieft E R, Garloff K, Van der Mullen J J A M and Banine V 2005 Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges Phys. Rev. E 71 036402
62. Kieft E R 2005 Transient behavior of EUV emitting discharge plasmas, a study by optical methods Thesis Eindhoven University of Technology
63. Svendsen W and O'Sullivan G 1994 Statistics and characteristics of XUV transition arrays from laser-produced plasmas of the elements tin through iodine Phys. Rev. A 50 3710-8
64. Tolstikhina I Yu, Churilov S S, Ryabtsev A N and Koshelev K N 2006 Atomic tin data EUV Sources for Lithography ed V Bakshi (Bellingham, WA: SPIE Press) pp 113-48
65. Churilov S S and Ryabtsev A N 2006 Opt. Spectrosc. 101 169-78
66. Churilov S S and Ryabtsev A N 2006 Analyses of the Sn IX-SN XII spectra in the EUV region Phys. Scr. 73 614-9 (Pubitemid 43958955)
67. Ryabtsev A N, Churilov S S, Novikov V G and Solomyannaya A D 2009 Fundamental spectroscopic data for In and Sn ions relevant to EUV projection lithography Atomic Structure and Collision Processes ed M Mohan (New Delhi: Narosa Publishing House) pp 69-80
68. O'Sullivan G et al 2006 Atomic physics in highly charged ions and the case for Sn as a source material EUV Sources for Lithography ed V Bakshi (Bellingham, WA: SPIE Press) p 149
69. Karazija R, Kucas S and Momkauskaite A 2006 Integral characteristics of spectra of ions important for EUV lithography J. Phys. D: Appl. Phys. 39 2973-8 (Pubitemid 43996674)
70. Kucas S, Karazija R, Jonauskas V and Momkauskaite A 2009 Interaction of 4p5.4d(N+1) and 4p6.4d(N-1).4f configurations and its influence on the photoexcitation and emission spectra in the isoelectronic and isonuclear sequences J. Phys. B: At. Mol. Opt. Phys. 42 5001
71. Sasaki A, Sunahara A, Furukawa H, Nishihara K, Fujioka S, Nishikawa T, Koike F, Ohashi H and Tanume H 2010 Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source J. Appl. Phys. 107 113303
72. Koshelev K, Banin V, Ivanov V, Zukakishvili G, Krivtsun V, Koloshnikov V, Korop E, Gayazov R, Sidelnikov Yu and Gomozov V 2002 Some physical aspects of EUV source problem Sematech EUVL Source Workshop (Dallas, TX, 2002)
73. Koshelev K, Banin V, Ivanov V, Zukakishvili G, Krivtsun V, Koloshnikov V, Korop E, Gayazov R, Sidelnikov Yu and Gomozov V 2003 Sematech EUVL Source Workshop (Antwerp, Belgium, September 2003)
74. Borisov V et al 2003 EUV Source Workshop (Antwerp, Belgium)
75. Koshelev K N and Pereira N 1991 J. Appl. Phys. 69 R21
76. Vikhrev V V, Ivanov V V and Koshelev K N 1982 Sov. J. Plasma Phys. 8 688
77. Peratt A L 1992 Physics of the Plasma Universe (Berlin: Springer)
78. Pereira N R and Davies J 1988 X-rays from z-pinches on relativistic electron beam generators J. Appl. Phys. 64 R1-R27
79. http://www.schulz-si.com
80. Antsiferov P S, Koshelev K N, Kramida A E and Panin A M 1989 J. Phys. D: Appl. Phys. 22 1073
81. Raizer Y P 1977 Laser-induced Discharge Phenomena (New York: Consultants Bureau)
82. Bolshov M A, Kasyanov Yu, Feshchenko R, Krivtsun V M, Ivanov V V and Koshelev K N 2008 Investigation of the dynamic of an expanding laser plume by a shadow graphic technique- Spectrochim. Acta B 63 324-31
83. Ivanov V V, Novikov V G, Koshelev K N, Krivtsun V M and Solomyannaya A D 2007 Calculation of tin emission spectra in discharge plasma: the influence of reabsorption in spectral lines High Energy Density Phys. 3 198-203
84. Berglund M, Rymell L and Hertz H M 1996 Ultraviolet prepulse for enhanced x-ray emission and brightness from droplet-target laser plasmas Appl. Phys. Lett. 69 1683
85. Brandt D C et al 2010 LPP EUV source production for HVM Presentation at Int. Symp. on Extreme Ultraviolet Lithography (Kobe, Japan, 19 October 2010)
86. Ehm D et al 2009 Mitigation of EUV optics contamination EUVL Symp. (Prague, Czech Republic, 19 October 2009)
87. Gielissen K 2009 The Nature and Characteristics of Particles Produced by EUV Sources: Exploration, Prevention and Mitigation Eindhoven University of Technology
88. Gielissen K, Sidelnikov Y, Glushkov D, Soer W A, Banine V and Van der Mullen J J A M 2010 Characterization of ion emission of an extreme ultraviolet generating discharge produced Sn plasma J. Appl. Phys. 107 013301
89. Fomenkov I V et al 2009 Laser-produced plasma light source for EUVL Proc. SPIE 7271 727138
90. 2 laser produced EUV light source Proc. SPIE 7361 73610X
91. Borisov V, Eltsov A, Ivanov A, Kirukhin Yu, Khristoforov O, Mishchenko V, Prokofiev A, Vinokhodov A and Stamm U 2007 Development of EUV sources with rotating disk electrodes at TRINITI Oral Presentation at EUVL Symp. (Sapporo, Japan)
92. Richardson et al 1993 Appl. Opt. 32 6901-10
93. Bender H A, O'Connell D and Silfvast W T 1995 Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography Appl. Opt. 34 6513
94. Ueno Y et al 2007 Characterization of various Sn targets with respect to debris and fast ion generation Proc. SPIE 6517 65173B
95. 2 laser-produced Sn plasma in EUV light source Proc. SPIE 7005 70052U
96. Mizoguchi H 2010 1st generation laser-produced plasma 100 W source system for HVM EUV lithography Presentation at Int. Symp. on Extreme Ultraviolet Lithography (Kobe, Japan, 19 October 2010)
97. Sporre J, Castano C H, Raju R and Ruzic D N 2009 Ionic debris measurement of three extreme ultraviolet sources J. Appl. Phys. 106 043304
98. Sjmaenok L 2010 Development of multilayer spectral purity filters for EUVL tools 2010 Int. Workshop on Extreme Ultraviolet Sources (Dublin, Ireland, 13-15 November 2010)
99. Tsarfati T, van de Kruijs R W E, Zoethout E, Louis E and Bijkerk F 2009 Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography Thin Solid Films 518 1365-8
100. Churilov S S, Kildiyarova R R, Ryabtsev A N and Sadovsky S V 2009 EUV spectra of Gd and Tb ions excited in laser-produced and vacuum spark plasmas Phys. Scr. 80 045303
101. Koshelev K, Krivtsun V, Gayazov R, Yakushev O, Chekmarev A, Banin V, Glushkov D and Yakunin A 2010 Experimental study of laser produced gadolinium plasma emitting at 6.7 nm 2010 Int. Workshop on Extreme Ultraviolet Sources (Dublin, Ireland, 13-15 November 2010)