EUV multilayer optics

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 703-706

  Feigl, Torsten ^a   Yulin, Sergiy ^a   Benoit, Nicolas ^a   Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Broadband; EUV; EUVL; Magnetron sputtering; Mo Si; Multilayer mirrors; Narrowband; Optics

Indexed keywords

DEPOSITION; LITHOGRAPHY; MAGNETRON SPUTTERING; MULTILAYERS; REFLECTION; SUBSTRATES;

BROADBAND; EUV; EUVL; MO/SI; MULTILAYER MIRRORS; NARROWBAND;

OPTICS;

EID: 33748279510     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.033     Document Type: Article

References (7)

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