LPP EUV conversion efficiency optimization

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 892-901

  Hoffman, J R ^a   Bykanov, A N ^a   Khodykin, O V ^a   Ershov, A I ^a   Bowering N R ^a   Fomenkov, I V ^a   Partlo, W N ^a   Myers, D W ^a  

^a CYMER INC   (United States)

Author keywords

Conversion efficiency; EUV lithography; EUV metrology; Laser produced plasma; Lithium; LPP; Planar targets; Source spot size; Spectral distribution; Spectrometer; Tin

Indexed keywords

LITHIUM; LITHOGRAPHY; OPTIMIZATION; PLASMA SOURCES; SPECTROMETERS; TIN; ULTRAVIOLET RADIATION;

CONVERSION EFFICIENCY; EUV LITHOGRAPHY; EUV METROLOGY; PLANAR TARGETS; SOURCE SPOT SIZE; SPECTRAL DISTRIBUTION;

LASER PRODUCED PLASMAS;

EID: 24644453474     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601048     Document Type: Conference Paper

References (4)

1. G Kooijman, R. de Bruijn, K. Koshelev, F. Bijkerk, W. Shaikh, A. J. Bodey, G. Hirst, "Propulse enchanced EUV yield from a xenon gas-jet laser produced plasma". Central Laser Facility Annual Report 2001/2002, p142-144.
2. N. R. Böwering, J. R. Huffman, O. V. Khodykin, C. L. Rettig, B. A. M. Hansson, A. I. Ershov, I. V. Fomenkov Metrology of laser-produced plasma light source for EUV lithography. Proceedings of SPIE XIX Metrology Conference. Santa Clara, 27 Feb-04 Mar 2005, #5752-144.
3. J. M. Algots, O. E. Hemberg, A. N. Bykanov. Liquid metal micro-droplet generator for laser produced plasma target delivery used in an extreme ultra-violet source. Proceedings of SPIE IX Emerging Lithographic Technologies Lithography Conference. Santa Clara, 27 Feb-04 Mar 2005, #5751-108.
4. J. J. MacFarlane, C. Rettig, I. E. Golovkin, P. R. Woodruff, P. Wang. Radiation-hydrodynamics, spectral, and atomic physics modeling of laser-produced plasma EUVL light sources. Proceedings of SPIE IX Emerging Lithographic Technologies Lithography Conference. Santa Clara, 27 Feb-04 Mar 2005, #5751-68.