Multilayer Zr/Si filters for EUV lithography and for radiation source metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7025, Issue , 2008, Pages

  Bibishkin, M S ^a   Chkhalo, N I ^a   Gusev, S A ^a   Kluenkov, E B ^a   Lopatin, A Ya ^a   Luchin, V I ^a   Pestov, A E ^a   Salashchenko, N N ^a   Shmaenok, L A ^b   Tsybin, N N ^a   Zuev, S Yu ^a  

^a INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^b PhysTech   (Netherlands)

Author keywords

EUV lithography; Freestanding multilayer; Spectral purity filter

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; JOULE HEATING; MULTILAYERS; PRESSURE EFFECTS;

FREESTANDING MULTILAYER; SPECTRAL PURITY FILTER;

OPTICAL FILTERS;

EID: 44349127796     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.802347     Document Type: Conference Paper

References (8)

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