Development of the ASML EUV alpha demo tool

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 90-101

  Mailing, Hans ^a   Banine, Vadim ^a   Harned, Noreen ^b   Blum, Brian ^b   Kürz, Peter ^c   Meijer, Henk ^a  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; LITHOGRAPHY; MASKS; MIRRORS; POLISHING; RISK MANAGEMENT; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PROJECTION OPTICS; RETICLES; SYSTEM PERFORMANCE;

OPTICAL DEVICES;

EID: 24644498099     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600725     Document Type: Conference Paper

References (21)

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