Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7005, Issue , 2008, Pages

  Ueno, Yoshifumi ^a   Soumagne, Georg ^a   Suganuma, Takashi ^a   Yabu, Takayuki ^a   Moriya, Masato ^a   Komori, Hiroshi ^a   Abe, Tamotsu ^a   Endo, Akira ^a   Sumitani, Akira ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

CO2 laser; Debris; Extreme Ultraviolet Lithography; Laser Produced Plasma; Magnetic field; Sn

Indexed keywords

LASER ABLATION; LASER APPLICATIONS; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHT SOURCES; LIGHTING; LITHOGRAPHY; MAGNETIC FIELDS; PULSED LASER DEPOSITION;

CO2 LASER; DEBRIS; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; HIGH POWERS; HIGH REPETITION RATES; HIGH VOLUME MANUFACTURING; HIGH-POWER LASERS; LASER PRODUCED PLASMA; MAGNETIC FIELD; SN;

ABLATION;

EID: 50249188188     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782475     Document Type: Conference Paper

References (8)

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