Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target

Applied Physics Letters

Volumn 91, Issue 23, 2007, Pages

  Ueno, Yoshifumi ^a   Soumagne, Georg ^a   Sumitani, Akira ^a   Endo, Akira ^a   Higashiguchi, Takeshi ^b  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY; LASER APPLICATIONS; ULTRAVIOLET RADIATION;

CAVITY TARGET; EUV EMISSION; LASER PULSE;

LIGHT EMISSION;

EID: 36849083445     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2820451     Document Type: Article

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