Laser-prQoduced plasma light source for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Fomenkov, Igor V ^a   Ershov, Alex I ^a   Partlo, William N ^a   Myers, David W ^a   Sandstrom, Richard L ^a   Böwering, Norbert R ^a   Vaschenko, Georgiy O ^a   Khodykin, Oleh V ^a   Bykanov, Alexander N ^a   Srivastava, Shailendra N ^a   Ahmad, Imtiaz ^a   Rajyaguru, Chirag ^a   Golich, Daniel J ^a   De Dea, Silvia ^a   Hou, Richard R ^a   O'Brien, Kevin M ^a   Dunstan, Wayne J ^a   Brandt, David C ^a  

^a CYMER INC   (United States)

Author keywords

EUV lithography; EUV source; Laser Produced Plasma

Indexed keywords

193-NM IMMERSION; ADVANCED LITHOGRAPHY; CRITICAL LAYER; DEBRIS MITIGATION; DROPLET GENERATION; EUV LITHOGRAPHY; EUV SOURCE; EXPERIMENTAL SYSTEM; EXTREME ULTRAVIOLETS; HIGH VOLUME MANUFACTURING; NORMAL INCIDENCE; PLASMA LIGHT SOURCE; SUBSYSTEM PERFORMANCE; SYSTEM USE; WITNESS SAMPLE;

DEBRIS; DROP FORMATION; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LIGHT SOURCES; LITHOGRAPHY; ULTRAVIOLET DEVICES;

ULTRAVIOLET LASERS;

EID: 77953375567     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848408     Document Type: Conference Paper

References (7)

1. I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak, in: Proc. of SPIE Vol. 6517, Emerging Lithographic Technologies XI, M. J. Lercel, ED., 65173J (2007).
2. D. C. Brandt, I. V. Fomenkov,, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffmann, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak, in: Proc. of SPIE Vol. 6517, Emerging Lithographic Technologies XI, M. J. Lercel, ED., 65170Q (2007).
3. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, N. R. Farrar, G. O. Vaschenko,O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, I. Ahmad, C. Rajyaguru, D.J. Golich, D. A. Vidusek, S. De Dea, R. R. Hou, in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727103, (2009).
4. I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, N. R. Farrar, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, D.J. Golich, D. A. Vidusek, S. De Dea, R. R. Hou, in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727138 (2009).
5. N. R. Böwering, I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Farrar, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, I. Ahmad, C. Rajyaguru, D.J. Golich, D. A. Vidusek, S. De Dea, R. R. Hou, Journal of Micro/Nanolith. MEMS MOEMS 8(4), 041504 (2009).
6. N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, W. N. Partlo, E. Vargas L., J. A. Chavez, I. V. Fomenkov, D. W. Myers, D. C. Brandt, in: Proc. of SPIE Vol. 6151, Emerging Lithographic Technologies X, M. J. Lercel, Ed., 61513R (2006).
7. J. M. Algots, O. Hemberg, A. Bykanov, in: Proc. of SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 248-259 (2005).