Tin DPP source collector module (SoCoMo): Status of Beta products and HVM developments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Yoshioka, Masaki ^a   Teramoto, Yusuke ^b   Zink, Peter ^c   Schriever, Guido ^a   Niimi, Gota ^b   Corthout, Marc ^c  

^a XTREME Technologies   (Germany)

^b Extreme Ultra Violet Lithography System Development Association   (Japan)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

EUV lithography; EUV sources; gas discharge produced plasma; Tin

Indexed keywords

13.5 NM; CENTRAL WAVELENGTH; COLLECTOR LIFETIME; COST OF OPERATIONS; DEBRIS MITIGATION; DISCHARGE-PRODUCED PLASMAS; DOMINANT FACTOR; EFFICIENCY IMPROVEMENT; ENGINEERING CHALLENGES; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV SOURCE; EXTREME ULTRAVIOLETS; EXTREME UV; GAS DISCHARGE PRODUCED PLASMA; HIGH VOLUME MANUFACTURING; HIGH-POWER; PHILIPS; PRE-PRODUCTION; PRODUCT RELIABILITY; ROADMAP; SOURCE SYSTEMS; THERMAL SCALING;

DEBRIS; EXTREME ULTRAVIOLET LITHOGRAPHY; GLOW DISCHARGES; LIGHT SOURCES; TIN; TITANIUM COMPOUNDS;

LITHOGRAPHY;

EID: 77953466419     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846545     Document Type: Conference Paper

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