Imaging budgets for extreme ultraviolet optics: Ready for 22-nm node and beyond

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Bienert, Marc ^a   Göhnemeier, Aksel ^a   Natt, Oliver ^a   Lowisch, Martin ^a   Gräupner, Paul ^a   Heil, Tilmann ^a   Garreis, Reiner ^a   Koen van Ingen Schenau, ^b   Steve Hansen, ^c  

^a CARL ZEISS SMT AG   (Germany)

^b ASML   (Netherlands)

^c ASML US Inc   (United States)

Author keywords

CDU budget; Extreme ultraviolet lithography; Imaging; Simulation

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; NANOTECHNOLOGY; PHOTORESISTS; THREE DIMENSIONAL; ULTRAVIOLET DEVICES;

AERIAL IMAGE SIMULATION; CDU BUDGET; CONTACT HOLES; CRITICAL DIMENSION UNIFORMITIES; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; HIERARCHICAL ORDER; IMAGING; PHYSICAL MECHANISM; SIMULATION; TEST STRUCTURE;

BUDGET CONTROL;

EID: 70349912240     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3238543     Document Type: Article

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