SCOPUS 정보 검색 플랫폼

Journal of Applied Physics

Volumn 106, Issue 4, 2009, Pages

Ionic debris measurement of three extreme ultraviolet sources

(4) Sporre, J a Castao, C H b Raju, R a Ruzic, D N a

a University of Illinois at Urbana Champaign (United States)

b Architectural and Environmental Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR MEASUREMENTS; CHARGE RATIO; CHARGE-EXCHANGE PHENOMENA; COLLECTOR LIFETIME; COLLECTOR OPTICS; DEBRIS MEASUREMENTS; DEBRIS MITIGATION; DOMINANT SPECIES; ELECTROSTATIC ENERGY ANALYZERS; ENERGETIC ION; EUV SOURCE; EXTREME ULTRAVIOLET LIGHT SOURCES; EXTREME ULTRAVIOLET SOURCES; ILLINOIS; ION FLUXES; ION SPECIES; LIGHT POWER; MITIGATION TECHNIQUES; OPERATING PRESSURE; PLASMA-MATERIAL INTERACTIONS; TWO SOURCES; UNIVERSITY OF ILLINOIS; XTS 13-35;

ARGON; CHARGE TRANSFER; DEBRIS; EXTREME ULTRAVIOLET LITHOGRAPHY; IONS; LIGHT; LIGHT SOURCES; LIGHT TRANSMISSION; PLASMAS; ULTRAVIOLET DEVICES; XENON;

PLASMA DIAGNOSTICS;

EID: 69749101312 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3176494 Document Type: Article

Times cited : (4)

References (14)

1
- 10644267839
- 0022-3727,. 10.1088/0022-3727/37/23/001
- V. Banine and R. Moors, J. Phys. D 0022-3727 37, 3207 (2004). 10.1088/0022-3727/37/23/001
- (2004) J. Phys. D , vol.37 , pp. 3207
- Banine, V.¹ Moors, R.²

2
- 10644258117
- 0022-3727,. 10.1088/0022-3727/37/23/005
- U. Stamm, J. Phys. D 0022-3727 37, 3244 (2004). 10.1088/0022-3727/37/23/ 005
- (2004) J. Phys. D , vol.37 , pp. 3244
- Stamm, U.¹

3
- 67149084875
- 0277-786X,. 10.1117/12.774156
- C. H. Castano, D. N. Ruzic, S. N. Srivastava, K. C. Thompson, and J. Sporre, Proc. SPIE 0277-786X 6921, 692137 (2008). 10.1117/12.774156
- (2008) Proc. SPIE , vol.6921 , pp. 692137
- Castano, C.H.¹ Ruzic, D.N.² Srivastava, S.N.³ Thompson, K.C.⁴ Sporre, J.⁵

4
- 69749113589
- ENERGETIQ, Inc., Woburn, MA.
- ENERGETIQ, Inc., Woburn, MA, http://www.energetiq.com/html/euv.html.

5
- 69749086648
- AIXUV GmbH, Aachen, Germany.
- AIXUV GmbH, Aachen, Germany, http://www.aixuv.de.

6
- 69749097802
- XTREME Technologies GmbH, Gottingen, Germany.
- XTREME Technologies GmbH, Gottingen, Germany, http://www.xtremetec.de.

7
- 69749094425
- Comstock, Inc., Oak Ridge, TN.
- Comstock, Inc., Oak Ridge, TN, http://www.comstockinc.com.

8
- 69749109118
- Burle Electro Optics, Sturbridge, MA.
- Burle Electro Optics, Sturbridge, MA, http://www.burle.com.

9
- 69749097322
- Aglient Technologies, Inc., Palo Alto, CA.
- Aglient Technologies, Inc., Palo Alto, CA, http://www.aglient.com.

10
- 69749119761
- 80/20, Inc., Warsaw, IN.
- Warsaw, IN, http://www.80/20.net 80/20, Inc.,.

11
- 33645696841
- 0021-8979,. 10.1063/1.2175471
- E. L. Antonsen, K. C. Thompson, M. R. Hendricks, D. A. Alman, B. E. Jurczyk, and D. N. Ruzic, J. Appl. Phys. 0021-8979 99, 063301 (2006). 10.1063/1.2175471
- (2006) J. Appl. Phys. , vol.99 , pp. 063301
- Antonsen, E.L.¹ Thompson, K.C.² Hendricks, M.R.³ Alman, D.A.⁴ Jurczyk, B.E.⁵ Ruzic, D.N.⁶

12
- 33244496207
- Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography
- DOI 10.1016/j.mee.2005.11.012, PII S0167931705005502
- K. C. Thompson, E. L. Antonsen, M. R. Hendricks, B. E. Jurczyk, M. Williams, and D. N. Ruzic, Microelectron. Eng. 0167-9317 83, 476 (2006). 10.1016/j.mee.2005.11.012 (Pubitemid 43277450)
- (2006) Microelectronic Engineering , vol.83 , Issue.3 , pp. 476-484
- Thompson, K.C.¹ Antonsen, E.L.² Hendricks, M.R.³ Jurczyk, B.E.⁴ Williams, M.⁵ Ruzic, D.N.⁶

13
- 69749087114
- Proceedings of the SPIE Advanced Lithography Conference, (unpublished), Vol.,.
- D. N. Ruzic, S. N. Srivastava, K. C. Thompson, J. Sporre, C. H. Castano, and R. Raju, Proceedings of the SPIE Advanced Lithography Conference, 2008 (unpublished), Vol. 72, p. 6921.
- (2008) , vol.72 , pp. 6921
- Ruzic, D.N.¹ Srivastava, S.N.² Thompson, K.C.³ Sporre, J.⁴ Castano, C.H.⁵ Raju, R.⁶

14
- 84960259042
- edited by V. Bakshi (SPIE, Bellingham, WA).
- EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Bellingham, WA, 2006).
- (2006) EUV Sources for Lithography

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.