Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Soer, Wouter A ^a   Jak, Martin J J ^a   Yakunin, Andrei M ^b   Van Herpen, Maarten M J W ^a   Banine, Vadim Y ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b ASML   (Netherlands)

Author keywords

CO2 laser; Electromagnetic shielding; EUV; EUV lithography; EUV source; Infrared; Laser produced plasma; Spectral purity; Spectral purity filter

Indexed keywords

CO2 LASER; EUV; EUV LITHOGRAPHY; EUV SOURCE; INFRARED; SPECTRAL PURITY; SPECTRAL PURITY FILTER;

ELECTRIC LOAD FORECASTING; ELECTROMAGNETIC SHIELDING; ELECTROMAGNETIC WAVES; EXTREME ULTRAVIOLET LITHOGRAPHY; INFRARED RADIATION; INFRARED SPECTROSCOPY; LASER PRODUCED PLASMAS; LASERS; RADIATION PROTECTION; RADIOMETERS; SHIELDING; SWITCHING FUNCTIONS; VACUUM;

ULTRAVIOLET DEVICES;

EID: 67149122428     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814231     Document Type: Conference Paper

References (6)

1. Banine V., Yakunin A., Salashchenko N., Kluenkov E., Lopatin A., Luchin V., Tsybin N., Shmaenok L., Soer W., Jak M., "Spectral purity filter development for EUV HVM", presented at Int. Symp. EUVL (2008).
2. Powell F.R., Johnson T.A., "Filter windows for EUV lithography", Proc. SPIE 4343, 585 (2001).
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4. Kierey H., Heidemann K.F., Kleemann B.H., Winters R., EgIe W.J., Singer W., Melzer F., Wevers R., Antoni M., "EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing", Proc. SPIE 5193, 70 (2004).
5. Herpen M.M.J.W. van, Kruijs R.W.E. van de, Klunder D.J.W., Louis E., Yakshin A.E., Alonso van der Westen S., Bijkerk F., Banine V., "Spectral purity enhancing layer for multi-layer mirrors", Opt. Lett. 33,560-562 (2008).
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