Relationship between an EUV source and the performance of an EUV lithographic system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 126-135

  Banine, Vadim ^a   Benschop, Jos ^a   Leenders, Martijn ^a   Moors, Roel ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE QUALITY; LIGHT REFLECTION; LIGHT SOURCES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); NEW GENERATION LITHOGRAPHY (NGL);

PHOTOLITHOGRAPHY;

EID: 0033713409     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)