Performance results of a new generation of 300 mm lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 544-557

  Sluijk, Boudewijn ^a   Castenmiller, Tom ^a   De Jongh, Richard Du Croo ^a   Jasper, Hans ^a   Modderman, Theo ^a   Levasier, Leon ^a   Loopstra, Erik ^a   Savenije, Guustaaf ^a   Boonman, Marc ^a   Cox, Harry ^a  

^a ASML   (Netherlands)

Author keywords

300 mm wafers; Advanced imaging; Alignment; Focusing; Overlay; Photolithography; Productivity; Stage design

Indexed keywords

CROSSTALK; IMAGING TECHNIQUES; OPTICAL RESOLVING POWER; SEMICONDUCTOR DEVICE MANUFACTURE;

AERIAL IMAGES;

PHOTOLITHOGRAPHY;

EID: 0011250436     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435752     Document Type: Article

References (7)

1. th quarter 1998.
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3. Christian Wagner, Winfried Kaiser, Jan Mulkens and Donis G. Flagello, "Advanced Technology for Extending Optical Lithography", SPIE Symposium on Microlithography, Santa Clara, February 27 - March 3, 2000.
4. Jo Finders et.al., "Can DUV lithography take us below 100 nm", SPIE Symposium on Microlithography, Santa Clara, February 25 - March 2, 2001.
5. Jan van Schoot, Frank Bornebroek, Manfred Suddendorf, Melchior Mulder, Jeroen van der Spek, Jan Stoeten and Adolph Hunter, "0.7 NA DUV Step & Scan System for 150nm Imaging with Improved Overlay", Proc. SPIE Microlithography, vol. 3679, pp 448-463, 1999.
6. Donis G. Flagello, Jan Mulkens, and Christian Wagner, "Optical Lithography into the Millennium: Sensitivity to Aberrations, Vibration and Polarization", SPIE Symposium on Microlithography, Santa Clara, February 27 - March 3, 2000.
7. Jo Finders, Jan van Schoot, Peter Vanoppen, Mircea Dusa, Bob Socha, Geert Vandenberghe, Kurt Ronse, "KrF Lithography for 130 nm", SPIE Symposium on Microlithography, Santa Clara, February 27 - March 3, 2000.