High-power extreme ultraviolet source based on gas jets

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 81-89

  Kubiak, Glenn D ^a   Bernardez, Luis J ^a   Krenz, Kevin ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; LASER PRODUCED PLASMAS; MIRRORS; PLASMA JETS; PLASMA SOURCES; REFLECTION; SPECTROSCOPIC ANALYSIS;

GAS JETS;

PHOTOLITHOGRAPHY;

EID: 0032402787     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309560     Document Type: Conference Paper

References (11)

1. Debris-free EUVL sources based on gas jets
2. Diffraction-limited soft x-ray projection lithography with a laser plasma source
3. Laser plasma sources for soft x-ray projection lithography: Production and mitigation of debris
4. Cryogenic pellet laser plasma source targets
5. Spectra of Xe VII, VIII, and IX in the extreme ultraviolet: 4d-mp, nf transitions
6. Mo/Be multilayer mirrors for normal incidence in the extreme ultraviolet