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Volumn 6151 I, Issue , 2006, Pages

EUV aources for the alpha-tools

Author keywords

EUV lithography; EUV source; Gas discharge plasma; Halogen cycle; Tin

Indexed keywords

CONTROL SYSTEMS; DISCHARGE LAMPS; EROSION; LASER PULSES; LIGHT EMISSION; TIN; VAPORS;

EID: 33745614594     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657066     Document Type: Conference Paper
Times cited : (21)

References (9)
  • 2
    • 24644459628 scopus 로고    scopus 로고
    • Philips' EUV lamp: Status and Roadmap
    • Antwerp, Belgium
    • J. Pankert et al., "Philips' EUV lamp: Status and Roadmap", second EUV lithography conference, Antwerp, Belgium (2003)
    • (2003) Second EUV Lithography Conference
    • Pankert, J.1
  • 3
    • 0141612960 scopus 로고    scopus 로고
    • Collection efficiency of EUV sources
    • March 23-28, Santa Clara
    • G. Derra and W. Singer, "Collection efficiency of EUV sources", SPIE Microlithography 2003, March 23-28, Santa Clara (2003)
    • (2003) SPIE Microlithography 2003
    • Derra, G.1    Singer, W.2
  • 5
    • 33745632283 scopus 로고    scopus 로고
    • Tin delivery systems for gas discharge sources
    • San Jose
    • G. Derra et al.: Tin Delivery Systems for Gas Discharge Sources, EUV Source Workshop, San Jose (2005)
    • (2005) EUV Source Workshop
    • Derra, G.1
  • 6
    • 33745629508 scopus 로고    scopus 로고
    • patent filing WO2005025280A2
    • patent filing WO2005025280A2
  • 8
    • 33745632533 scopus 로고    scopus 로고
    • Integrating Philips' extreme UV source in the alpha-tools
    • J. Pankert et al., "Integrating Philips' extreme UV source in the alpha-tools", Proc. of SPIE (2005)
    • (2005) Proc. of SPIE
    • Pankert, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.