Optical element for full spectral purity from IRgenerated EUV light sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Van Den Boogaard, A J R ^a   Louis, E ^a   Van Goor, F A ^b   Bijkerk, F ^a,b  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Blazed grating; EUV lithography; EUV source; Infrared; Mo Si multilayers; Out of band radiation; Spectral purity

Indexed keywords

BLAZED GRATING; EUV LITHOGRAPHY; EUV SOURCE; INFRARED; MO/SI MULTILAYERS; OUT OF BAND RADIATION; SPECTRAL PURITY;

EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LIGHT; LIGHT SOURCES; MULTILAYERS; RADIATION; REFLECTION;

ULTRAVIOLET DEVICES;

EID: 67149138439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.829011     Document Type: Conference Paper

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