Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Bianucci, G ^a   Bragheri, A ^a   Cassol, G L ^a   Johnson, B ^a   Rossi, M ^a   Zocchi, F E ^a  

^a Media Lario Technologies   (Italy)

Author keywords

Collector; DPP; EUV; EUV source; EUVL; Extreme Ultraviolet; LPP; Thermal management

Indexed keywords

A-CENTER; COLLECTION EFFICIENCY; DEBRIS MITIGATION; DISCHARGE-PRODUCED PLASMAS; EUV SOURCE; EXTREME ULTRAVIOLET; EXTREME UV; GRAZING INCIDENCE; HIGH VOLUME MANUFACTURING; IN-FIELD; LASER-PRODUCED PLASMA SOURCES; LPP SOURCES; MIRROR SUBSTRATE; MO/SI MULTILAYER; NORMAL INCIDENCE; OPTICAL STABILITY; PHILIPS; REFLECTIVE LAYERS; REFLECTIVITY VALUES; REPLICATION TECHNOLOGY; ROOM TEMPERATURE; STABLE OPERATION; THERMAL CONTROL SYSTEMS; THERMAL MANAGEMENT;

CONTROL SYSTEM STABILITY; DEBRIS; ELECTRIC DISCHARGES; ELECTROFORMING; EXTREME ULTRAVIOLET LITHOGRAPHY; INTERCALATION; LASER PRODUCED PLASMAS; LIGHT SOURCES; MIRRORS; REFLECTION; THERMOANALYSIS; TIN; ULTRAVIOLET DEVICES;

TEMPERATURE CONTROL;

EID: 77953452461     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846712     Document Type: Conference Paper

References (8)

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