1st generation laser-produced plasma source system for HVM EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Mizoguchi, Hakaru ^b   Abe, Tamotsu ^a   Watanabe, Yukio ^a   Ishihara, Takanobu ^a   Ohta, Takeshi ^a   Hori, Tsukasa ^a   Kurosu, Akihiko ^a   Komori, Hiroshi ^a   Kakizaki, Kouji ^a   Sumitani, Akira ^a   Wakabayashi, Osamu ^b   Nakarai, Hiroaki ^b   Fujimoto, Junichi ^b   Endo, Akira ^c  

^a EUVA   (Japan)

^b Gigaphoton   (Japan)

^c FRAUNHOFER GESELLSCHAFT   (Germany)

Author keywords

CO2 laser; EUV; EUV light source; laser produced plasma; Lithography

Indexed keywords

CONTINUOUS OPERATION; DOUBLE PULSE; DUTY CYCLES; EUV; EUV LIGHT SOURCE; EUV LIGHT SOURCES; EUV LITHOGRAPHY; LASER SYSTEMS; LASER-PRODUCED PLASMA SOURCES; LONG TERM PERFORMANCE; MAGNETIC MITIGATION; MITIGATION SYSTEMS; ON TIME; PRE-PULSE PLASMA; SHORT PULSE;

CONVERSION EFFICIENCY; DEBRIS; LASER PRODUCED PLASMAS; LIGHT SOURCES; LITHOGRAPHY; MAGNETIC FIELDS; PLASMA SOURCES; TIN;

PULSED LASER APPLICATIONS;

EID: 77953456293     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846271     Document Type: Conference Paper

References (8)

1. Rob Hartman, Closing address presentation at 2006 international EUVL symposium, October 2006, Barcelona, Spain.
2. K. Nishihara, A. Sasaki, A. Sunahara, and T. Nishikawa, EUV Sources for Lithography, Chap. 11, ed. V. Bakshi, SPIE, Bellingham, 2005.
3. H. Tanaka, A. Matsumoto, K. Akinaga, A. Takahashi, and T. Okada, "Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas" Appl. Phys. Lett. 87, 041503 (2005)
4. H. Hoshino, T. Suganuma, T. Asayama, K. Nowak, M. Moriya, T. Abe, A. Endo, A. Sumitani, "LPP EUV light source employing high-power CO2 laser", Proc. SPIE 6921, 692131 (2008)
5. M. Nakano, T. Yabu, H. Someya, T. Abe, G. Soumagne, A. Endo, A. Sumitani, "Sn droplet target development for laser produced plasma EUV light source", Proc. SPIE 6921, 692130 (2008)
6. Y. Ueno, G. Soumagne, M. Moriya, T. Suganuma, T. Abe, H. Komori, A. Endo, A. Sumitani , "Magnetic debris mitigation of a CO2 laser-produced Sn plasma," Proc. SPIE 6921, 692112Z (2008)
7. A. Endo, H. Komori, Y. Ueno, K. M. Nowak, T. Yabu, T. Yanagida, T. Suganuma, T. Asayama, H. Someya, H. Hoshino, M. Nakano, M. Moriya, T. Nishisaka, T. Abe, A. Sumitani, H. Nagano, Y. Sasaki, S. Nagai, Y. Watanabe, G. Soumagne, T. Ishihara, O. Wakabayashi, K. Kakizaki, H. Mizoguchi "Laser-produced plasma source development for EUV lithography" Proc. SPIE 7271-07, Alternative Lithographic Technologies (2009)
8. , T. Suganuma, G. Soumagne, M. Moriya, T. Abe, A. Endo, A. Sumitani "Evaluation at the intermediate focus for EUV light source" Proc. SPIE 7271-114, Alternative Lithographic Technologies (2009)