Litho and patterning challenges for memory and logic applications at the 22-nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Finders, Jo ^a   Dusa, Mircea ^b   Nikolsky, Peter ^a   Van Dommelen, Youri ^c   Watso, Robert ^b   Vandeweyer, Tom ^c   Beckaert, Joost ^c   Laenens, Bart ^c   Van Look, Lieve ^c  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c IMEC   (Belgium)

Author keywords

best focus difference per feature; Direct Spacer Defined DPT; Double Patterning Lithography; HM hardmask; Line Space CDU populations; Spacer Self Aligned

Indexed keywords

LITHOGRAPHY; NANOTECHNOLOGY;

BEST FOCUS DIFFERENCE PER FEATURE; DIRECT SPACER DEFINED DPT; DOUBLE PATTERNING; HM-HARDMASK; LINE/SPACE CDU POPULATIONS; SELF-ALIGNED;

STATIC RANDOM ACCESS STORAGE;

EID: 79959215861     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848330     Document Type: Conference Paper

References (7)

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3. Jo Finders et al, "Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control", Proceedings Vol. SPIE 7274 2009.
4. Sean D. Burns et al., "Evaluation of Double-Patterning Techniques for Advanced Logic Nodes", SPIE proceedings 2010, to be published.
5. Birgitt Hepp et al., "Critical Assessment of Error Budget Components in Double Patterning Immersion Lithography", Proceedings immersion symposium 2007.
6. Michael Ben Yishai et al., "An IntenCD map of a reticle as a feed-forward input to DoseMapper", Proceedings SPIE, 7028, 2008.
7. Ute Buttgereit et al., "Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements", Proceedings SPIE 2010, to be published.