Xenon target performance characteristics for laser-produced plasma EUV sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 94-101

  Shields, Harry ^a   Fornaca, Steven W ^a   Petach, Michael B ^a   Michaelian, Mark ^a   McGregor, R D ^a   Moyer, Richard H ^b   St Pierre, Randall ^b  

^a NORTHROP GRUMMAN CORPORATION   (United States)

^b Cutting Edge Optronics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; EROSION; INTERFACES (MATERIALS); LASER PRODUCED PLASMAS; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

RADIATION DISTRIBUTION;

XENON;

EID: 0036378636     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472266     Document Type: Article

References (13)

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