메뉴 건너뛰기




Volumn 39, Issue 14, 2006, Pages 2973-2978

Integral characteristics of spectra of ions important for EUV lithography

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; INDIUM; IODINE; IONIZATION; LITHOGRAPHY; PHASE TRANSITIONS; QUENCHING; SPECTRUM ANALYSIS; TELLURIUM; TIN; XENON;

EID: 33745727704     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/14/016     Document Type: Article
Times cited : (11)

References (22)
  • 1
    • 33646731733 scopus 로고    scopus 로고
    • Special Cluster on Extreme Ultraviolet Light Sources for Semiconductor Manufacturing
    • Attwood D 2004 Special Cluster on Extreme Ultraviolet Light Sources for Semiconductor Manufacturing J. Phys. D: Appl. Phys. 37 (issue 23)
    • (2004) J. Phys. D: Appl. Phys. , vol.37 , Issue.23
    • Attwood, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.