Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  George, Simi A ^a   Naulleau, Patrick P ^a   Rekawa, Senajith ^a   Gullikson, Eric ^a   Kemp, Charles Drew ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

EUVL; Extreme ultraviolet; Flare; MET; Out of band; Resist sensitivity; Resists

Indexed keywords

EUVL; EXTREME ULTRAVIOLET; FLARE; MET; OUT OF BAND; RESIST SENSITIVITY; RESISTS;

ELECTRON BEAM LITHOGRAPHY; EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PULSES; LIGHT; LIGHT SOURCES; MULTILAYERS; OPTICAL DESIGN; OPTICAL MULTILAYERS; PULSED LASER APPLICATIONS; REFLECTION; ULTRAVIOLET DEVICES; WAVELENGTH;

OPTICS;

EID: 67149136864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814429     Document Type: Conference Paper

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