Development of a high pulse rate EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Horne, Stephen F ^a   Niell, Fred M ^a   Partlow, Matthew J ^a   Besen, Matthew M ^a   Smith, Donald K ^a   Blackborow, Paul A ^a   Gustafson, Deborah ^a  

^a ENERGETIQ TECHNOLOGY INC   (United States)

Author keywords

Electrodeless; EUV; Z pinch

Indexed keywords

13.5 NM; DEFECT INSPECTION; DESIGN PROCESS; ELECTRODELESS; EUV; EUV SOURCE; HIGH FREQUENCY HF; HIGH PULSE RATE; HIGH VOLUME MANUFACTURING; INFRASTRUCTURE DEVELOPMENT; OPERATING CHARACTERISTICS; PHYSICAL PROCESS; PULSE FREQUENCIES; PULSE RATE; TECHNICAL RISKS; Z-PINCH;

EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; OPTICAL TESTING; PINCH EFFECT; WIRELESS TELECOMMUNICATION SYSTEMS; XENON;

ULTRAVIOLET DEVICES;

EID: 67149104320     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813765     Document Type: Conference Paper

References (4)

1. Blackborow, P.A., Partlow, M.J., Home, S.F., Besen, M.M., Smith, D.K., D. S. Gustafson, D.S., "EUV Source Development at Energetiq," Emerging Lithographic Technologies XII 6921(1), p. 692121, SPIE, (2008).
2. Brandt, D.C. et al, "LPP EUV source development for HVM," Emerging Lithographic Technologies XI 6517, p. 65170, SPIE, (2007).
3. Smith, P. W. [Transient Electronics: Pulsed Circuit Technology], Wiley, Chichester, (2002)
4. Seshadri, S. R., [Fundamentals of Plasma Physics], American Elsivier Publishing Co. Inc., New York, (1973)