Laser-produced plasma light source for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Fomenkov, Igor V ^a   Brandt, David C ^a   Bykanov, Alexander N ^a   Ershov, Alex I ^a   Partlo, William N ^a   Myers, David W ^a   Böwering, Norbert R ^a   Farrar, Nigel R ^a   Vaschenko, Georgiy O ^a   Khodykin, Oleh V ^a   Hoffman, Jerzy R ^a   Chrobak, Christopher P ^a   Srivastava, Shailendra N ^a   Golich, Daniel J ^a   Vidusek, David A ^a   De Dea, Silvia ^a   Hou, Richard R ^a  

^a CYMER INC   (United States)

Author keywords

Collector; EUV lithography; EUV source; Laser produced plasma; Plasma

Indexed keywords

ADVANCED LITHOGRAPHY; CHARGE STATE; COLLECTOR; CRITICAL PARAMETER; DEBRIS MITIGATION; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV SOURCE; EXTREME ULTRAVIOLETS; FARADAY CUPS; HIGH VOLUME MANUFACTURING; HIGH-ENERGY IONS; INCIDENT ANGLES; INCIDENT PARTICLES; ION DISTRIBUTIONS; ION ENERGIES; ION ENERGY DISTRIBUTIONS; LIFE-TEST; MIRROR COATING; REPETITION RATE; SCANNER MANUFACTURERS; SHORT WAVELENGTHS; SPATIAL AND TEMPORAL DISTRIBUTION; TARGET MATERIALS;

ANGULAR DISTRIBUTION; DEBRIS; DUST COLLECTORS; EXTREME ULTRAVIOLET LITHOGRAPHY; INTEGRATED CIRCUITS; IONS; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHTING; LITHOGRAPHY; MIRRORS; SCANNING; TARGETS; TIN; ULTRAVIOLET DEVICES;

PLASMA DIAGNOSTICS;

EID: 67149139972     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814272     Document Type: Conference Paper

References (6)

1. K. Ota, Y. Watanabe, V. Banine, H. Franken, in: "EUV Sources for Lithography", Edt. Vivek Bakshi, (SPIE Press, Bellingham, WA 2005), Chapter 2, p 27-43.
2. I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partió, D. W. Myers, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak. "Laserproduced plasma source system development" in Emerging Lithographic Technologies XI, edited by Michael J. Lercel, Proc. of SPIE Vol. 6517 (SPIE, Bellingham, WA, 2007) 6517 3J.
3. N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B.A.M. Hansson, W. N. Partió, E. Vargas L., J. A. Chavez, I. V. Fomenkov, D. W. Myers, D. C. Brandt, "EUV Source Collector", va. Emerging Lithographic Technologies X, edited by M. J. Lercel, Proc. of SPIE Vol. 6151 (SPIE, Bellingham, WA, 2006) 61513R.
4. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partió, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak, "LPP EUV Source Development for HVM", in Emerging Lithographic Technologies XI, edited by M. J. Lercel, Proc. of SPIE, Vol.6517-25 (SPIE, Bellingham, WA, 2007).
5. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partió, D. W. Myers, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffmann, C. P. Chrobak, S. N. Srivastava, D. A. Vidusek, S. De Dea, R. R. Huo "Laser-produced plasma source system development" in: Lithography Asia 2008, Proc. SPIE Vol. 7140 (SPIE, Bellingham, WA, 2008) 7140 IE.
6. N. R. Böwering, J. R. Hoffman, O. V. Khodykin, C. L. Rettig, B. A. M. Hansson, A. I. Ershov, I. V. Fomenkov, "Metrology of laser-produced plasma light source for EUV lithography", in Metrology, Inspection, and Process Control for Microlithography XIX, edited by Richard M. Silver, Proc. of SPIE Vol. 5752 (SPIE, Bellingham, WA, 2005) 1248-1256. (Pubitemid 41275176)