Influence of annealing on the structural and optical properties of thin multilayer EUV filters containing Zr, Mo, and silicides of these metals

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7521, Issue , 2010, Pages

  Chkhalo, N I ^a   Gusev, S A ^a   Drozdov, M N ^a   Kluenkov, E B ^a   Lopatin, A Ya ^a   Luchin, V I ^a   Pestov, A E ^a   Salashchenko, N N ^a   Shmaenok, L A ^b   Tsybin, N N ^a  

^a INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^b PhysTeX   (Netherlands)

Author keywords

EUV lithography; freestanding multilayer; spectral purity filter

Indexed keywords

ANNEALED SAMPLES; AT-WAVELENGTH; BACKGROUND RADIATION; EUV LITHOGRAPHY; EUV SOURCE; FREESTANDING MULTILAYER; FUTURE GENERATIONS; HIGH EFFICIENCY; IR SPECTRAL RANGE; LASER PLASMA; MULTILAYER STRUCTURES; OPTICAL MEASUREMENT; ORDERS OF MAGNITUDE; OUT-OF-BAND RADIATION; SECONDARY IONS; SPECTRAL INTENSITY; SPECTRAL PURITY; STRUCTURAL AND OPTICAL PROPERTIES; THIN MULTILAYERS; VACUUM HEATING;

EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; LITHOGRAPHY; MULTILAYERS; OPTICAL DATA PROCESSING; SILICIDES; STRUCTURAL METALS; TRANSPARENCY; ZIRCONIUM;

OPTICAL MULTILAYERS;

EID: 79551699530     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.854728     Document Type: Conference Paper

References (7)

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