Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 71, Issue 3, 2005, Pages

  Kieft, E R ^a   Garloff, K ^a   Van Der Mullen, J J A M ^a   Banine, V ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE PLASMAS; ELECTRON TEMPERATURE; EXTREME ULTRAVIOLET (EUV); IONIZING PLASMA;

LITHOGRAPHY; MATHEMATICAL MODELS; MOLYBDENUM COMPOUNDS; OPTICAL DEVICES; PLASMAS; TIN; ULTRAVIOLET RADIATION;

XENON;

EID: 41349106329     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.71.036402     Document Type: Article

References (38)

1. M. A. Klosner and W. T. Silfvast, Opt. Lett. 23, 1609 (1998).
2. S. R. Mohanty, C. Cachoncinlle, C. Fleurier, E. Robert, J.-M. Pouvesle, R. Viladrosa, and R. Dussart, Microelectron. Eng. 61-62, 179 (2002).
3. M. McGeoch, Appl. Opt. 37, 1651 (1998).
4. V. M. Borisov, I. Ahmad, S. Goetze, A. S. Ivanov, O. B. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, U. Stamm, and A. Y. Vinokhodov, Proc. SPIE 4688, 626 (2002).
5. W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T. Melnychuk, and J. E. Rauch, Proc. SPIE 4343, 232 (2001).
6. M. W. McGeoch and C. T. Pike, Proc. SPIE 5037, 141 (2003).
7. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, Appl. Opt. 38, 5413 (1999).
8. Proceedings of the EUV Source Workshop, International SEMATECH, Antwerp, Belgium, edited by V. Bakshi, 2003.
9. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, and V. Banine, Phys. Rev. E 68, 056403 (2003).
10. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, V. Banine, and K. N. Koshelev, Phys. Rev. E 71, 026409 (2005).
11. R. Radtke, C. Biedermann, J. L. Schwob, P. Mandelbaum, and R. Doron, Phys. Rev. A 64, 012720 (2001).
12. K. Asmussen, K. B. Fournier, J. M. Laming, R. Neu, J. F. Seely, R. Dux, W. Engelhardt, J. C. Fuchs, and ASDEX Upgrade Team, Nucl. Fusion 38, 967 (1998).
13. M. J. May, K. B. Fournier, D. Pacella, H. Kroegler, J. E. Rice, B. Gregory, M. Finkenthal, H. W. Moos, G. Mazzitelli, and W. H. Goldstein, Phys. Rev. E 61, 3042 (2000).
14. V. A. Soukhanovskii, S. Lippmann, M. J. May, M. Finkenthal, H. W. Moos, K. B. Fournier, W. Goldstein, D. Pacella, and G. Mazzitelli, Astron. Astrophys., Suppl. Ser. 142, 95 (2000).
15. F. Gilleron, M. Poirier, T. Blenski, M. Schmidt, and T. Ceccotti, J. Appl. Phys. 94, 2086 (2003).
16. N. Böwering, M. Martins, W. N. Partlo, and I. V. Fomenkov, J. Appl. Phys. 95, 16 (2004).
17. M. C. Richardson, C.-S. Koay, K. Takenoshita, C. Keyser, S. George, S. Teerawattanasook, M. Al-Rabban, and H. Scott, Proc. SPIE 5374, 447 (2004).
18. K. Garloff, M. van den Donker, J. J. A. M. van der Mullen, F. van Goor, R. Brummans, and J. Jonkers, Phys. Rev. E 66, 036403 (2002).
19. J. J. A. M. van der Mullen, Ph.D. thesis, Eindhoven University of Technology, Eindhoven, 1986, http://alexandria.tue.nl/extra3/proefschrift/PRF5A/ 8601253.pdf
20. J. A. M. van der Mullen, Phys. Rep. 191, 109 (1990).
21. Y.-K. Kim, MCDF on-line execution, http://amods.kaeri.re.kr/mcdf/MCDF. html
22. L. Vriens and A. H. M. Smeets, Phys. Rev. A 22, 940 (1980).
23. H. van Regemorter, Astrophys. J. 136, 906 (1962).
24. M. J. Seaton, Mon. Not. R. Astron. Soc. 119, 81 (1959).
25. A. C. Kolb and R. W. P. McWhirter, Phys. Fluids 7, 519 (1964).
26. M. Masnavi, M. Nakajima, and K. Horioka, J. Plasma Fusion Res. 79, 1188 (2003).
27. T. Fujimoto, J. Phys. Soc. Jpn. 47, 273 (1979).
28. H. R. Griem, Phys. Rev. 165, 258 (1968).
29. R. D. Cowan, The Theory of Atomic Structure and Spectra (University of California Press, Berkeley, 1981) (code in a version for personal computers, edited by A. Kramida, at http://das101.isan.troitsk.ru/cowan.htm).
30. H. Henneken, F. Scholze, M. Krumrey, and G. Ulm, Metrologia 37, 485 (2000).
31. R. H. Day, P. Lee, E. B. Saloman, and D. J. Nagel, J. Appl. Phys. 52, 6965 (1981).
32. http://www-cxro.lbl.gov/optical_constants/
33. R. Stuik, H. Fledderus, P. Hegeman, J. Jonkers, M. Visser, V. Banine, and F. Bijkerk, in Proceedings of the Second SEMATECH Workshop on Extreme UV Lithography, San Francisco, 2002 (unpublished).
34. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, V. Banine, and K. N. Koshelev, Phys. Rev. E 70, 056413 (2004).
35. S. S. Churilov and Y. N. Joshi, Phys. Scr. 65, 40 (2002).
36. J. Blackburn, P. Carroll, J. Costello, and G. O'Sullivan, J. Opt. Soc. Am. 73, 1325 (1983).
37. G. O'Sullivan, J. Phys. B 15, L765 (1982).
38. B. A. Trubnikov, Rev. Plasma Phys. 1, 105 (1965).