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Advanced Materials

Volumn 13, Issue 10, 2001, Pages 703-714

Organic-inorganic nanocomposites: Unique resists for nanolithography

(4) Gonsalves, K E a Merhari, L b Wu, H c Hu, Y d

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b University City Blvd ^* (United States)

c CERAMEC R and D (France)

d UNIVERSITY OF CONNECTICUT (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FULLERENES; NANOTECHNOLOGY; PARTICLE SIZE ANALYSIS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; TEMPERATURE; ULSI CIRCUITS;

NANOIMPRINTING; SEMICONDUCTOR INDUSTRY; SOFTENING TEMPERATURE;

NANOSTRUCTURED MATERIALS;

EID: 0035901999 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200105)13:10<703::AID-ADMA703>3.0.CO;2-A Document Type: Review

Times cited : (111)

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