Limits to etch resistance for 193-nm single-layer resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 365-376

  Kunz, Roderick R ^a   Palmateer, Susan C ^a   Forte, Anthony R ^a   Allen, Robert D ^a   Wallraff, Gregory M ^a   DiPietro, Richard A ^a   Hofer, Donald C ^a  

^a MIT LINCOLN LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISTRY; ETCHING; INTEGRATED CIRCUITS; PLASMA DEVICES; POLYMERS; PROCESS CONTROL; ULTRAVIOLET RADIATION;

SELECTIVE ETCHING; SINGLE-LAYER RESISTS;

PHOTORESISTS;

EID: 0029748674     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241835     Document Type: Conference Paper

References (19)