Systematic studies of fullerene derivative electron beam resists

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 115-120

  Robinson, A P G ^a   Palmer, R E ^a   Tada, T ^a   Kanayama, T ^a   Shelley, E J ^a   Philp, D ^a   Preece, J A ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON IRRADIATION; ORGANIC SOLVENTS;

ELECTRON BEAM RESISTS; METHANOFULLERENE; MONOCHLOROBENZENE;

FULLERENES;

EID: 0033693911     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (25)