Outlook for 157-nm resist design

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 561-570

  Kunz, R R ^a   Bloomstein, T M ^a   Hardy, D E ^a   Goodman, R B ^a   Downs, D K ^a   Curtin, J E ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

157 nm lithography; Fluoropolymer; Photoresist; Vacuum ultraviolet

Indexed keywords

EID: 0000696221     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.561     Document Type: Article

References (20)

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