Photo and scanning probe lithography using alkylsilane self-assembled monolayers

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 163-168

  Sugimura, H ^a   Hanji, T ^a   Takai, O ^a   Fukuda, K ^a   Misawa, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DRY ETCHING; ELECTROCHEMISTRY; IRRADIATION; MASKS; PHOTOLITHOGRAPHY; PLASMA ETCHING; SEMICONDUCTING SILICON; SILANES;

OCTADECYLTRIMETHOXYSILANE; PHOTOMASK; SCANNING PROBE LITHOGRAPHY; WET CHEMICAL ETCHING;

MONOLAYERS;

EID: 0033724497     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/PROC-584-163     Document Type: Article

References (0)