Electron-beam lithography with metal colloids: Direct writing of metallic nanostructures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 77-79

  Lohau, J ^a   Friedrichowski, S ^a   Dumpich, G ^a   Wassermann, E F ^a   Winter, M ^b   Reetz, M T ^b  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b MAX PLANCK INSTITUT FÜR KOHLENFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002266993     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589838     Document Type: Article

References (10)

1. See, for example, T. Tao, JaeSang Ro, J. Melngailis, Z. Xue, and H. D. Kaesz, J. Vac. Sci. Technol. B 8, 1826 (1990).
2. See, for example, H.G. Craighead and L. M. Schiavone, Appl. Phys. Lett. 48, 1748 (1986).
3. T. J. Stark, T. M. Mayer, D. P. Griffis, and P.E. Russell, J. Vac. Sci. Technol. B 9, 3475 (1991).
4. P. Hoffmann, G. Ben Assayag, J. Gierak, J. Flicstein, M. Maar-Stumm, and H. van den Bergh, J. Appl. Phys. 74, 7588 (1993).
5. P. Hoffmann, H. van den Bergh, J. Flicstein, G. Ben Assayag, J. Gierak, and J.-F. Bresse, J. Vac. Sci. Technol. B 9, 3483 (1991).
6. M. E. Gross, W. L. Brown, L. R. Harriott, K. D. Cummings, J. Linnros, and H. Funsten, J. Appl. Phys. 66, 1403 (1989).
7. M. T. Reetz, M. Winter, G. Dumpich, J. Lohau, and S. Friedrichowski, J. Am. Chem. Soc. 119, 4539 (1997).
8. M. T. Reetz and S. A. Quaiser, Angew. Chem. Int. Ed. Engl. 34, 2240 (1995).
9. A. Carl, G. Dumpich, and E. F. Wassermann, Thin Solid Films 193, 1065 (1990).
10. A. Carl, G. Dumpich, and D. Hallfarth, Phys. Rev. B 39, 3015 (1989).