A Fullerene derivative as an electron beam resist for nanolithography

Applied Physics Letters

Volumn 72, Issue 11, 1998, Pages 1302-1304

  Robinson, A P G ^a   Palmer, R E ^a   Tada, T ^b   Kanayama, T ^b   Preece, J A ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; COATING TECHNIQUES; DERIVATIVES; FULLERENES; NANOTECHNOLOGY; PLASMA ETCHING; POLYMERIZATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SURFACES; THICK FILMS;

ELECTRON BEAM RESIST; MONOCHLOROBENZENE; SPIN COATING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032025032     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120978     Document Type: Article

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