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Volumn 584, Issue , 2000, Pages 85-96
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Resist materials and nanolithography
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
DIFFUSION IN SOLIDS;
ELECTRON BEAMS;
MATHEMATICAL MODELS;
MOLECULAR WEIGHT;
MONOLAYERS;
POLYMETHYL METHACRYLATES;
REACTION KINETICS;
SCANNING TUNNELING MICROSCOPY;
SWELLING;
CHEMICALLY AMPLIFIED RESISTS;
DENSE GRATINGS;
RESIST MATERIALS;
SELF ASSEMBLED MONOLAYERS;
NANOTECHNOLOGY;
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EID: 0033678115
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
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Times cited : (1)
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References (38)
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