Critical issues in 157 nm lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3154-3157

  Bloomstein, T M ^a   Rothschild, M ^a   Kunz, R R ^a   Hardy, D E ^a   Goodman, R B ^a   Palmacci, S T ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744307460     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590455     Document Type: Article

References (14)

1. T. M. Bloomstein, M. W. Horn, M. Rothschild, R. R. Kunz, S. T. Palmacci, and R. B. Goodman, J. Vac. Sci. Technol. B 15, 2112 (1997).
2. 2 lasers.
3. H. H. Li, J. Phys. Chem. Ref. Data 9, 161 (1980).
4. V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, and C. VanPeski, Proc. SPIE 3334, 470 (1998).
5. S. V. Babin, V. V. Kozunov, and I. Yu. Kuzmin, Proc. SPIE 2884, 520 (1996).
6. B. Shamoun, M. Sprague, R. Engelstad, and F. Cerrina, Proc. SPIE 3331, 275 (1998).
7. K. Harada and S. Sugawara, J. Appl. Polym. Sci. 27, 1441 (1982).
8. N. K. Eib and R. J. Kvitek, J. Vac. Sci. Technol. B 7, 1502 (1989).
9. S. V. Babin, J. Vac. Sci. Technol. B 15, 2209 (1997).
10. W. J. Tropf, M. E. Thomas, and T. J. Harris, in The Handbook of Optics, Devices, Measurements, and Properties, Optical Society of America, edited by M. Bass (McGraw-Hill, New York, 1994), Chap. 33.
11. A. Feldman, D. Horowitz, R. M. Waxler, and M. J. Dodge, NBSIR 78, 1473 (1978).
12. R. E. Schenker and W. G. Oldham, J. Appl. Phys. 82, 1065 (1997).
13. H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol. B 16, 69 (1998).
14. A. S. Gozdz, Polym. Adv. Technol. 5, 70 (1990).