10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist

Journal of Physics D: Applied Physics

Volumn 32, Issue 16, 1999, Pages

  Robinson, A P G ^a   Palmer, R E ^a   Tada, T ^b,c   Kanayama, T ^b,c   Allen, M T ^a   Preece, J A ^a   Harris, K D M ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

^c ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON IRRADIATION; LIQUID CRYSTAL POLYMERS; ORGANIC SOLVENTS; PHOTORESISTS; QUANTUM THEORY; SUBSTRATES;

COULOMB BLOCKADE; HIGH RESOLUTION ELECTRON BEAM RESIST; MINIATURIZATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032593304     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/16/102     Document Type: Article

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