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Volumn 35, Issue 1 A, 1996, Pages
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Nanolithography using fullerene films as an electron beam resist
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Author keywords
[No Author keywords available]
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Indexed keywords
DISSOLUTION;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON CYCLOTRON RESONANCE;
IRRADIATION;
NANOTECHNOLOGY;
ORGANIC SOLVENTS;
PHOTORESISTS;
PLASMA ETCHING;
SEMICONDUCTING SILICON;
SENSITIVITY ANALYSIS;
THIN FILMS;
ELECTRON BEAM RESISTS;
ELECTRON CYCLOTRON RESONANCE MICROWAVE PLASMA ETCHING;
ETCHING MASKS;
FULLERENE FILMS;
MONOCHLOROBENZENE;
FULLERENES;
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EID: 0029757019
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.35.l63 Document Type: Article |
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Times cited : (108)
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References (5)
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