New developments in resist materials for the SCALPEL technology

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 541-546

  Novembre, Anthony E ^a   Ocola, Leonidas E ^a   Houlihan, Frank ^a   Knurek, Chester ^a   Blakey, Myrtle ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001534824     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.541     Document Type: Article

References (6)

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2. L. R. Harriott et al., Microelect.. Eng., 35 (1997), 477.
3. A. E. Novembre, J. M. Kometani, C. S. Knurek, U. Kumar, T. X. Neenan, D. A. Mixon, O. Nalamasu, N. Munzel, Microelectronic Eng., 27, 389, (1995)
4. F. M. Houlihan, T. I. Wallow, O. Nalamasu, E. Reichmanis, Macromolecules, 30 (1997), 6517.
5. W. K. Waskiewicz, L. R. Harriott, J. A. Liddle, 5. T. Stanton, S. D. Berger, E. Munro, X. Zhu, Microelect. Eng., 41 (1998), 215.
6. To be presented at the 42nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication.