Low-energy electron-beam lithography using calixarene

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 4, 1999, Pages 1594-1597

  Tilke, A ^a  

^a UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644449772     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590795     Document Type: Article

References (12)

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