Combinatorial approach for the synthesis of terpolymers and their novel application as very-high-contrast resists for X-ray nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 325-327

  Gonsalves, Kenneth E ^a   Wang, Jianzhao ^a   Wu, Hengpeng ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; NANOTECHNOLOGY; OLIGOMERS; POLYMETHYL METHACRYLATES; SYNTHESIS (CHEMICAL); TERPOLYMERS; X RAY LITHOGRAPHY;

POLYHEDRAL OLIGOSILSESQUIOXANES;

SEMICONDUCTING POLYMERS;

EID: 0033725628     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591193     Document Type: Article

References (4)

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