High resolution organic resists for charged particle lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 3, 1999, Pages 933-938

  Ochiai, Yukinori ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644449635     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590672     Document Type: Article

References (18)

1. A. N. Broers, E. G. Lean, and M. Hatzakis, Appl. Phys. Lett. 15, 98 (1969).
2. S. P. Beaumont, P. G. Bower, T. Tamamura, and C. D. W. Wilkinson, Appl. Phys. Lett. 38, 436 (1981).
3. R. L. Seliger, J. W. Ward, V. Wang, and R. L. Kubena, Appl. Phys. Lett. 34, 310 (1979).
4. G. Stengl, R. Kaitna, H. Loschner, P. Wolf, and R. Sacher, J. Vac. Sci. Technol. 16, 1883 (1979).
5. F. Emoto, K. Gamo, S. Namba, N. Samoto, and R. Shimizu, Jpn. J. Appl. Phys., Part 2 24, L809 (1985).
6. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
7. S. Manako, Y. Ochiai, J. Fujita, N. Samoto, and S. Matsui, Jpn. J. Appl. Phys., Part 1 33, 6993 (1994).
8. T. Yoshimura, H. Shiraishi, J. Amamoto, and S. Okazaki, Appl. Phys. Lett. 63, 764 (1993).
9. Y. Ochiai, S. Manako, S. Samukawa, K. Takeuchi, and T. Yamamoto, Microelectron. Eng. 30, 415 (1996).
10. J. Fujita, H. Watanabe, Y. Ochiai, S. Manako, J. S. Tsai, and S. Matsui, J. Vac. Sci. Technol. B 13, 2757 (1995).
11. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. 68, 1297 (1996).
12. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, J. Vac. Sci. Technol. B 14, 4272 (1996).
13. K. Itaya, K. Shibayama, and T. Fujimoto, J. Electrochem. Soc. 129, 663 (1982).
14. Y. Ochiai, M. Baba, H. Watanabe, and S. Matsui, Jpn. J. Appl. Phys., Part 1 30, 3266 (1991).
15. C. D. Gutsche, Royal Soc. Chem., Cambridge, 1989.
16. Y. Ohnishi, J. Fujita, Y. Ochiai, and S. Matsui, Microelectron. Eng. 35, 117 (1996).
17. N. Mita, U.S. Patent No. 5 (1992).
18. H. Y. Ku and L. C. Scala, J. Electrochem. Soc. 116, 663 (1982).