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Volumn 16, Issue 1, 1998, Pages 69-76

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

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[No Author keywords available]

Indexed keywords


EID: 0002053947     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589837     Document Type: Article
Times cited : (282)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.