Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 69-76

  Namatsu, Hideo ^a   Takahashi, Yasuo ^a   Yamazaki, Kenji ^a   Yamaguchi, Toru ^a   Nagase, Masao ^a   Kurihara, Kenji ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002053947     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589837     Document Type: Article

References (18)

1. A. N. Broers, J. Electrochem. Soc. 128, 166 (1981).
2. X. Pan, D. R. Allee, A. N. Broers, Y. S. Tang, and W. Wilkinson, Appl. Phys. Lett. 59, 3157 (1991).
3. M. Isaacson and A. Murray, J. Vac. Sci. Technol. 19, 111 (1981).
4. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
5. E. W. Scheckler, S. Shukuri, and E. Takeda, Jpn. J. Appl. Phys., Part 1 32, 327 (1993).
6. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki, Appl. Phys. Lett. 63, 764 (1993).
7. M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate, K. Murase, and T. Makino, Microelectron. Eng. 30, 419 (1996).
8. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara, Appl. Phys. Lett. 71, 2388 (1997).
9. Y. Takahashi, H. Namatsu, K. Kurihara, K. Iwadate, M. Nagase, and K. Murase, IEEE Trans. Electron Devices 43, 1213 (1996).
10. C. L. Frye and W. T. Collins, J. Am. Chem. Soc. 92, 5586 (1970).
11. P. A. Agaskar and W. G. Klemperer, Inorg. Chim. Acta 229, 335 (1995).
12. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, H. Takenaka, and K. Murase, Jpn. J. Appl. Phys., Part 1 34, 6940 (1995).
13. A. L. Smith, Analysis of Silicone (Krieger, Florida, 1983).
14. H. Namatsu, J. Electrochem. Soc. 136, 2676 (1989).
15. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara (unpublished).
16. W. Yau and S. Rementer, J. Liq. Chromatogr. 13, 627 (1990).
17. J. N. Israelachvili, Intermolecular and Surface Forces (Academic, New York, 1985).
18. H. Namatsu, M. Nagase, K. Kurihara, K. Iwadate, T. Furuta, and K. Murase, J. Vac. Sci. Technol. B 13, 1473 (1995).